{"product_id":"9783527353187","title":"PRE-ORDER NOW HfO2-Based Ferroelectric Materials : Fabrication, Characterization and Device Applications by Xubing Lu","description":"\u003cp\u003e \u003cstrong\u003e PRE-ORDER NOW - Published: 10\/06\/2026 \u003c\/strong\u003e\u003c\/p\u003eExplores HfO2-based ferroelectrics for memory, sensing, and advanced electronic applications  Ferroelectric hafnium oxide (HfO2)-based materials have transformed the field of electronic materials and device design, offering pathways to overcome long-standing barriers in scalability, compatibility, and reliability. The emergence of robust ferroelectricity in doped HfO2 has revolutionized both research and industry perspectives, providing a viable solution where conventional ferroelectrics often fell short. With contributions from leading experts, HfO2-Based Ferroelectric Materials addresses the critical need for a consolidated reference on HfO2-based ferroelectrics, offering foundational knowledge as well as the latest insights into fabrication, material characterization, and device integration. The book opens with fundamentals of ferroelectricity and the mechanisms driving HfO2-based ferroelectric behavior, before progressing to detailed examinations of deposition techniques, superlattice structures, and reliability considerations. It further explores a broad spectrum of applications, including non-volatile memories, neuromorphic computing, compute-in-memory architectures, and negative capacitance transistors, alongside emerging roles in energy storage, microwave technologies, and piezoelectric systems. Special attention is given to persistent challenges-such as the wake-up effect, fatigue, and imprint issues-and the strategies developed to mitigate them.  An authoritative and well-structured resource for advancing the frontiers of electronic materials and device technologies, HfO2-Based Ferroelectric Materials: Explains the origins of ferroelectricity in doped HfO2 and its unique material advantagesDetails deposition techniques and approaches to regulating ferroelectric behaviorExamines device-level challenges, including wake-up effect, fatigue, and imprint reliabilityHighlights applications spanning non-volatile memories, neuromorphic computing, and energy-efficient devicesDiscusses advanced designs such as superlattice-like laminate structures and 3D ferroelectric memoriesProvides insight into the reliability of HfO2-based thin films, capacitors, and field-effect transistors HfO2-Based Ferroelectric Materials: Fabrication, Characterization, and Device Applications is an essential resource for materials scientists, electronics engineers, semiconductor and solid-state physicists, and professionals in the semiconductor and sensor industries. It is also a valuable reference for graduate-level courses in electronic materials, semiconductor devices, and advanced nanotechnology within physics, materials science, and electrical engineering degree programs. \u003cbr\u003e  \u003cbr\u003eBinding: Hardback","brand":"Gardners","offers":[{"title":"Default Title","offer_id":56369501045109,"sku":"9783527353187","price":135.0,"currency_code":"GBP","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0612\/7193\/3106\/files\/9783527353187.jpg?v=1774539206","url":"https:\/\/backstory.london\/products\/9783527353187","provider":"Backstory","version":"1.0","type":"link"}